Two-phase immersion-cooled rack with a condenser loop

Junction → spreaderRcond=0.0275 K/W8 in parallel = 0.003438 K/WJunction → spreaderRcond=0.0275 K/W8 in parallel = 0.003438 K/WPool boilingRconv=0.00375 K/Wq=3200 WCondensing filmRconv=0.0028 K/Wq=3200 WTechnical water, rack → CDUqw=3200 WCDU plate exchangerRhx=0.0019 K/Wq=4000 WDry coolerRconv=0.0058 K/Wq=4000 WFluid inventoryCf=240000 J/KProcessor dissipationPp=400 Weach of 8 = 3200 WPump workPpump=800 WProcessor junctionTj=72 °CHeat spreaderTihs=61 °CDielectric fluid, boiling / condensingTsat=49 °CCondenser coilTcoil=40 °CTechnical water (30 °C in)Tw=38 °CFacility waterTfw=26 °CAmbient airTamb=24 °C

Repeated groups: